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Reaction-Diffusion Analysis for One-Step Plasma Etching and Bonding of Microfluidic Devices

Reaction-Diffusion Analysis for One-Step Plasma Etching and Bonding of Microfluidic Devices, Michel Rosso, Volkert van Steijn, Louis C. P. M. de Smet, Ernst J. R. Sudholter, Chris R. Kleijn, and Michiel T. Kreutzer. Applied Physics Letters 2011, 98  (17), 174102.

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Abstract

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BibTeX

@article{ ISI:000290046100077,
Author = {Rosso, Michel and van Steijn, Volkert and de Smet, Louis C. P. M. and Sudholter, Ernst J. R. and Kleijn, Chris R. and Kreutzer, Michiel T.},
Title = {Reaction-Diffusion Analysis for One-Step Plasma Etching and Bonding of Microfluidic Devices},
Journal = {Applied Physics Letters},
Year = {2011},
Volume = {98},
Number = {17},
Month = {},
DOI = {10.1063/1.3578450},
Pages = {174102},
ISSN = {0003-6951},
ResearcherID-Numbers = {Kreutzer, Michiel/F-3130-2010 Kleijn, Chris/A-7321-2008 de Smet, Louis/A-4364-2017},
ORCID-Numbers = {de Smet, Louis/0000-0001-7252-4047},
Times-Cited = {0},
Unique-ID = {ISI:000290046100077},
}

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