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Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions, David Valdesueiro, Gabrie M. H. Meesters, Michiel T. Kreutzer, and J. Ruud van Ommen. Materials 2015, 8  (3), 1249–1263.

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Abstract

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BibTeX

@article{ ISI:000351945400027,
Author = {Valdesueiro, David and Meesters, Gabrie M. H. and Kreutzer, Michiel T. and van Ommen, J. Ruud},
Title = {Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions},
Journal = {Materials},
Year = {2015},
Volume = {8},
Number = {3},
Pages = {1249-1263},
Month = {},
DOI = {10.3390/ma8031249},
ISSN = {1996-1944},
ResearcherID-Numbers = {van Ommen, Ruud/A-4119-2009},
ORCID-Numbers = {van Ommen, Ruud/0000-0001-7884-0323},
Times-Cited = {7},
Unique-ID = {ISI:000351945400027},
}

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