Product and Process Engineering - Delft University of Technology

Sorted by YearSorted by First Author

Modeling the Precursor Utilization in Atomic Layer Deposition on Nanostructured Materials in Fluidized Bed Reactors

Modeling the Precursor Utilization in Atomic Layer Deposition on Nanostructured Materials in Fluidized Bed Reactors, Fabio Grillo, Michiel T. Kreutzer, and J. Ruud van Ommen. Chemical Engineering Journal 2015, 268 , 384–398.

Download

[DOI] 

Abstract

(unavailable)

BibTeX

@article{ ISI:000352247100042,
Author = {Grillo, Fabio and Kreutzer, Michiel T. and van Ommen, J. Ruud},
Title = {Modeling the Precursor Utilization in Atomic Layer Deposition on Nanostructured Materials in Fluidized Bed Reactors},
Journal = {Chemical Engineering Journal},
Year = {2015},
Volume = {268},
Pages = {384-398},
Month = {},
DOI = {10.1016/j.cej.2015.01.067},
ISSN = {1385-8947},
EISSN = {1873-3212},
ResearcherID-Numbers = {van Ommen, Ruud/A-4119-2009},
ORCID-Numbers = {van Ommen, Ruud/0000-0001-7884-0323},
Times-Cited = {12},
Unique-ID = {ISI:000352247100042},
}

Generated by bib2html.pl (written by Patrick Riley ) on Wed Mar 22, 2017 18:15:52


. © Delft University of Technology - PPE group 2015