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Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature

Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature, David Valdesueiro, Mahesh Krishna Prabhu, Carlos Guerra-Nunez, C. S. Suchand Sandeep, Sachin Kinge, Laurens D. A. Siebbeles, Louis C. P. M. de Smet, Gabrie M. H. Meesters, Michiel T. Kreutzer, Allan J. Houtepen, and J. Ruud van Ommen. Journal of Physical Chemistry C 2016, 120  (8), 4266–4275.

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BibTeX

@article{ ISI:000371562000013,
Author = {Valdesueiro, David and Prabhu, Mahesh Krishna and Guerra-Nunez, Carlos and Sandeep, C. S. Suchand and Kinge, Sachin and Siebbeles, Laurens D. A. and de Smet, Louis C. P. M. and Meesters, Gabrie M. H. and Kreutzer, Michiel T. and Houtepen, Allan J. and van Ommen, J. Ruud},
Title = {Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature},
Journal = {Journal of Physical Chemistry C},
Year = {2016},
Volume = {120},
Number = {8},
Pages = {4266-4275},
Month = {},
DOI = {10.1021/acs.jpcc.5b11653},
ISSN = {1932-7447},
ResearcherID-Numbers = {Houtepen, Arjan/E-9754-2011 van Ommen, Ruud/A-4119-2009 de Smet, Louis/A-4364-2017},
ORCID-Numbers = {Houtepen, Arjan/0000-0001-8328-443X van Ommen, Ruud/0000-0001-7884-0323 de Smet, Louis/0000-0001-7252-4047},
Times-Cited = {1},
Unique-ID = {ISI:000371562000013},
}

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