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Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (Atip): a Combined Experimental and Theoretical Study

Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (Atip): a Combined Experimental and Theoretical Study, Truong Ba Tai, LiAo Cao, Felix Mattelaer, Geert Rampelberg, Fatemeh S. M. Hashemi, Jolien Dendooven, J. Ruud van Ommen, Christophe Detavernier, and Marie-Francoise Reyniers. Journal of Physical Chemistry C 2019, 123  (1), 485–494.

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BibTeX

@article{ ISI:000455561100050,
Author = {Truong Ba Tai and Cao, LiAo and Mattelaer, Felix and Rampelberg, Geert and Hashemi, Fatemeh S. M. and Dendooven, Jolien and van Ommen, J. Ruud and Detavernier, Christophe and Reyniers, Marie-Francoise},
Title = {Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (Atip): a Combined Experimental and Theoretical Study},
Journal = {Journal of Physical Chemistry C},
Year = {2019},
Volume = {123},
Number = {1},
Pages = {485-494},
Month = {},
DOI = {10.1021/acs.jpcc.8b09198},
ISSN = {1932-7447},
Times-Cited = {0},
Unique-ID = {ISI:000455561100050},
}

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